Focused Ion Beam (FIB)
Focussed Ion Beam (FIB) is a microscopy technique in which a beam of ions can be used to destructively remove material through a process known as sputtering. Gallium ion dual beam systems are now widely available; these systems are well suited to TEM sample preparation, ion channelling imaging and small 3D reconstructions.
LMCC has two focussed ion beam systems one which uses a gallium ion source and another which uses a Xenon plasma. Our Xenon plasma FIB (PFIB) has revolutionised the sector - we can now produce cross sections up to 800 µm in width. This new functionality has proved invaluable to both academic researchers and clients from industry.
Uses & Capabilities
Typical industrial uses
Cross sections
- Paint defects
- Corrosion products
- Thickness and composition of deposited coatings
- Internal structure of powders and fibres
- Fuel cell layer thickness and composition
- Failure analysis / comparison
TEM sample preparation
- TEM sample preparation
- Bulk metals and ceramics
- Powders
- Site specific lift outs
- Crystal orientation specific lift outs for dislocation and precipitate analysis
In situ STEM imaging
- Particle size analysis of nm scale powders
- Preliminary TEM sample screening of carbon extraction replica and electro polished samples
3D reconstructions
- Precipitate to void analysis in steels
- 3D visualisation of failure locations in electrical packaging
Key Capabilities
- 3D reconstructions (serial sectioning)
- Atom probe preparation
- Cross section analysis
- Crystal orientation specific TEM sample preparation
- Energy Dispersive Spectroscopy (EDS)
- Everhart-Thornley Secondary Electron Detector (SE)
- HD Backscattered Electron Detector (BSD)
- MEMS hot stage analysis
- TEM sample preparation
Case Studies
Are you interested in using this technique?
If you are interested in using this technique and would like further information please do not hesitate to get in touch.