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Chemically Amplified Molecular Resists for Electron Beam Lithography |
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AUTHOR(S) |
TITLE |
JOURNAL/CONFERENCE |
YEAR |
VOL. |
PAGE |
| F.P. Gibbons, H.M. Zaid, M. Manickam, J.A. Preece, R.E. Palmer, A.P.G. Robinson | A Chemically Amplified Fullerene Derivative Molecular Electron Beam Resist |
Small |
2007 |
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| F.P. Gibbons, J. Manyam S. Diegoli, M. Manickam, J.A. Preece, R.E. Palmer, A.P.G. Robinson | Chemically Amplified Molecular Resists for E-Beam Lithography |
Microelectronic Engineering |
2008 |
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| F.P. Gibbons, A.P.G. Robinson, S. Diegoli, M. Manickam , J.A. Preece and R.E. Palmer | Fullerene Resist Materials for the 32nm Node and Beyond |
Advanced Functional Materials |
2008 |
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| A.P.G. Robinson, H.M. Zaid, M. Manickam, J.A. Preece, R.E. Palmer | Anomalous acid diffusion in a triphenylene molecular resist with melamine crosslinker | Microelectronic Engineering | 2008 | ||
| X. Chen, R.E. Palmer, A.P.G. Robinson | A high resolution water soluble fullerene molecular resist for electron beam lithography | Nanotechnology | 2008 | ||
| J. Manyam, F.P. Gibbons, S. Diegoli, M. Manickam, J.A. Preece, R.E. Palmer and A.P.G. Robinson | Chemically Amplified Molecular Resists for e-Beam Lithography (Extended Abstract) | Microprocesses and Nanotechnology 2007, Digest of Papers, ed. H. Arimoto, Japan Society of Applied Physics, Tokyo, Japan |
2007 | 530 | |
| J. Manyam, F.P. Gibbons, S. Diegoli, M. Manickam, J.A. Preece, R.E. Palmer, A.P.G. Robinson | Chemically amplified molecular resists for e-beam lithography (Refereed) | Proc. SPIE: Advances in Resist Materials and Processing Technology XXV,10.1117/12.772645 | 2008 | ||
| H.M. Zaid, A.P.G. Robinson, R.E. Palmer, M. Manickam and J.A. Preece | Chemical Amplification of a Triphenylene Molecular Electron Beam Resist | Advanced Functional Materials | 2007 | ||
| F.P. Gibbons, J. Manyam, S. Diegoli, M. Manickam, J.A. Preece, R.E. Palmer, A.P.G. Robinson | Chemically Amplified Molecular Resists for E-Beam Lithography | Microelectronic Engineering | 2008 | ||
| A.P.G. Robinson; F.P. Gibbons, M. Manickam, J.A. Preece, R.E. Palmer, A.P.G. Robinson | Direct Electron-Beam Writing of Highly Conductive Wires in Functionalized Fullerene Films | Small | 2009 | ||
| X. Chen, A.P.G. Robinson, M. Manickam and J.A. Preece | Suppression of Pinhole Defects in Fullerene Molecular Electron Beam Resists | Microelectronic Engineering | 2007 | ||
| Liu, C., Huang, Z., Conway, P.P. and Thomson, R.C. | Materials behaviour and intermetallics characteristics in the reaction between SnAgCu and SnPb solder alloys | Journal of Materials Science | 2007 | ||
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